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    Home»Tech News»Leading the Way for a Novel Nanosheet Chip Fab Process
    Tech News

    Leading the Way for a Novel Nanosheet Chip Fab Process

    Ironside NewsBy Ironside NewsAugust 7, 2025No Comments7 Mins Read
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    Kamal Rudra discovered the subject of semiconductors fairly boring when he encountered it in highschool. However that every one modified when he took a university course on semiconductor optoelectronics. He credit the category’s professor with sparking his curiosity within the know-how.

    “His educating type was participating and extremely efficient,” Rudra says. “It made me genuinely fall in love with the topic. The mix of hands-on lab experiments and deep theoretical studying lastly gave me readability that this was the sector I wished to pursue.”

    Kamal Rudra

    Employer:

    IBM Analysis in Albany, N.Y.

    Title:

    Analysis and growth integration engineer

    Member grade:

    Member

    Alma maters:

    Motilal Nehru Nationwide Institute of Expertise in Allahabad, India; College of Michigan in Ann Arbor

    An IEEE member, Rudra is now engaged on a brand new nanosheet chip fabrication course of as a analysis and growth integration engineer at IBM Research in Albany, N.Y.

    The strategy makes use of the self-aligned litho-etch litho-etch approach to create copper wiring buildings for back-end-of-line (BEOL) integrated circuits at a pitch of 21 to 23 nanometers. The approach is used for gate-all-around transistors, which comprise nanosheets: skinny, stacked layers of silicon which are surrounded by the gate’s electrode. Nanosheets improve management over present stream, scale back leakage, and allow greater transistor density, in line with IBM.

    The fabrication challenge is a joint initiative between IBM Analysis and Rapidus, a Japanese semiconductor producer headquartered in Tokyo.

    “Nanosheet transistors are paving the way in which for quicker and more-energy-efficient processors for AI and different makes use of,” Rudra says. “By enhancing the BEOL interconnects, RC delay and electromigration could be decreased, making certain transistor-level positive aspects translate into system-level efficiency.”

    For his work, he was acknowledged final 12 months on the IEEE Computer Society’s Top 30 Early Career Professionals in Computing checklist and obtained US $2,500.

    The Pc Society recognition “reinforces my perception that I’m shifting in the precise route,” Rudra says, “and it encourages me to maintain pushing the boundaries of what’s doable in semiconductor know-how and computing.”

    Impressed by a physics trainer

    Like many engineers, Rudra was fascinated by how issues labored as a teen. Rising up in India, he would take aside remote-controlled vehicles and use the motors and batteries to construct one thing new.

    Nobody in his household labored in science, know-how, engineering, or math, he says, however science has at all times felt “utterly pure.”

    His fascination with STEM topics deepened in highschool, and his lecturers fueled his ardour. However it was M.R. Shenoy, a physics professor on the Indian Institute of Technology, Delhi, who impressed him to pursue analysis within the semiconductor discipline.

    As an undergraduate on the Motilal Nehru National Institute of Technology, in Allahabad, India, Rudra took a web-based semiconductor optoelectronics certification course provided by NPTEL that was taught by Shenoy.

    Motivated to realize expertise within the discipline, from 2017 to 2019 Rudra accomplished a number of internships engaged on semiconductor fabrication at organizations together with the Indian Institute of technology (BHU), Varanasi; the Indian Institute of Technology, Kharagpur; and the Central Electronics Engineering Research Institute.

    “These internships had been my first actual publicity to experimental analysis and gave me a basis in system physics and materials science,” he says.

    He earned a bachelor’s diploma in electronics and communications engineering from MNNIT in 2019.

    Working in fabrication and FinFET

    After graduating he grew to become a analysis assistant on the Indian Institute of Science (IISc), in Bengaluru.

    There he developed a thin film of manganese vanadium oxide utilizing the epitaxy course of. The strategy grows the manganese vanadium oxide on prime of the crystal substrate—which supplies engineers extra management over the movie’s thickness, composition, and crystal construction, in line with Photonics Media. Rudra used the movie to develop a photodetector for infrared light.

    After a 12 months he joined semiconductor producer GlobalFoundries, additionally in Bengaluru, as an integration and yield engineer. He continued his work at IISc on the weekends.

    “Earlier than becoming a member of, I had modest expectations—largely due to the restricted semiconductor manufacturing ecosystem in India,” he says. “However I noticed that hardware-focused work was certainly taking place within the trade. That have planted the seed of transitioning from academia to cutting-edge industrial R&D.”

    “For any younger skilled in STEM, IEEE isn’t only a useful resource; it’s a launchpad.”

    Whereas at GlobalFoundries, he labored on BEOL interconnects to boost the yield of the corporate’s FinFET chips, that are utilized in automotive know-how, smartphones, and good audio system. In standard planar transistors, the gate sits atop a flat silicon channel, controlling the stream of present between the supply and drain from just one aspect. As transistors shrank in dimension, nevertheless, they grew to become less reliable and leaked current, losing energy. FinFET growth was led by Chenming Hu, who obtained the 2020 IEEE Medal of Honor for the invention. FinFET’s 3D construction offers higher management of the present.

    In 2021 Rudra determined to proceed his schooling and was accepted into the grasp’s diploma program in electrical and computer engineering on the University of Michigan in Ann Arbor.

    “I selected this college as a result of there was a selected professor engaged on LED units whose analysis actually resonated with me,” he says. The professor, IEEE Fellow Zetian Mi, was engaged on III-V semiconductor optoelectronic devices. Rudra was a part of Mi’s analysis crew for the primary two semesters of his graduate program, engaged on the fabrication and characterization of III-Nitride-based microLEDs. Rudra additionally accomplished an internship at Meta in Redmond, Wash., the place he developed integration processes for waveguide-based photonic units for AR/VR methods.

    “That have helped me perceive how photonics intersects with semiconductor manufacturing,” he says, “notably in rising functions like next-gen shows and wearable optics.”

    After incomes his diploma in 2023, he joined Samsung Semiconductor in Austin, Texas, as a tool integration engineer. There he returned to engaged on FinFETs, however this time analyzing and optimizing system and front-end-of-line integration for 14-nm node know-how and the way totally different processes have an effect on {the electrical} efficiency and yield of FinFETs.

    After a 12 months, he left to hitch IBM Research.

    “It’s been one of the crucial fulfilling selections of my profession to date,” he says. “Being a part of such a high-impact, globally collaborative initiative has been a implausible expertise and one which continues to push me technically and professionally.”

    Since working on the firm, he has filed 22 U.S. patents.

    He obtained a slew of honors final 12 months, together with being named to Semicon West’s 20 Below 30 checklist, the Society of Manufacturing Engineers’s 30 Below 30, and Semicon Europa’s 20 Below 30. Just lately, he made the Albany Business Review 40 Below 40 checklist.

    “These recognitions,” he says, “have been deeply motivating—not simply as private milestones however as validation of the collective work I’ve been a part of, and the mentors who’ve helped form my path.”

    Making vital connections at IEEE

    Rudra joined IEEE in 2020 after his “Visible Light Response in Defect Engineered Wrinkle Network Nanostructured ZnO” analysis paper was accepted by the IEEE Electron Devices Technology and Manufacturing Conference. He continues to resume his membership, he says, due to the networking alternatives it offers, in addition to technical content material that helps him keep updated on semiconductors.

    Along with the IEEE Computer Society, he’s an lively member of the IEEE Electron Devices (EDS), Electronics Packaging, and Photonics societies. Every “is residence to a vibrant community of engineers, scientists, and innovators who’re completed of their respective fields,” Rudra says.

    In 2022 he obtained an Electron Devices Society master’s fellowship, which awarded him $2,000 to make use of towards analysis throughout the society’s fields of curiosity. Receiving the consideration, he says, was a robust motivator.

    He’s lively with IEEE Young Professionals and is a member of the Electron Devices Society’s YP committee. Being part of the neighborhood, he says, provides him entry to world-class experience and offers sources to assist him make profession selections and clear up technical challenges.

    He’s additionally part of the organizing committee for this 12 months’s IEEE EDS Summer School, a two-day lecture program for college seniors, graduate college students, postdoctoral fellows, and young professionals.

    “For any younger skilled in STEM, I consider IEEE isn’t only a useful resource; it’s a launchpad,” Rudra says. “Getting concerned early helps you develop technically, professionally, and personally in a approach few organizations can provide.”

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